Commercial plasma source ion implantation facility

نویسندگان
چکیده

برای دانلود باید عضویت طلایی داشته باشید

برای دانلود متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید

اگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید

منابع مشابه

Thyratron Modulators in Plasma Source Ion Implantation

Plasma Source Ion Implantation (PSII) is an emerging technology which can be used to harden metal surfaces in a conformal manner. North Star Research Corp. (NSRC) is building a unique implanter system for Empire Hard Chrome which will be the first truly commercial implanter of this type. The choice of pulsed power technology for this application is important from the standpoint of both reliabil...

متن کامل

Ion Source Development at the Agor Facility∗

This paper discusses the present status of ion source development at KVI. Work is mainly focussed on increasing the beam intensity of the ECRIS injector and to optimize the beam transport and injection into the AGOR cyclotron. The ultimate goal is to deliver a 1 kW beam of heavy ions on target. Recent progress towards this goal is discussed. We also present the first results of beam extraction ...

متن کامل

Enhanced Life Ion Source For Germanium And Carbon Ion Implantation

Germanium and carbon ions represent a significant portion of total ion implantation steps in the process flow. Very often ion source materials that used to produce ions are chemically aggressive, especially at higher temperatures, and result in fast ion source performance degradation and a very limited lifetime. GeF4 and CO2 are commonly used to generate germanium and carbon beams. In the case ...

متن کامل

Diagnostic characterization of ablation plasma ion implantation

Experiments are reported in which two configurations for ablation-plasma-ion-implantation ~APII! are characterized by diagnostics and compared. The first configuration oriented the target parallel to the deposition substrate. This orientation yielded ion-beam-assisted deposition of thin films. A delay (.5 ms) between laser and high voltage was necessary for this geometry to avoid arcing between...

متن کامل

Semiconductor applications of plasma immersion ion implantation

Plasma immersion ion implantation (PIII) is an established technique in certain niche microelectronics applications such as the synthesis of silicon-oninsulator. In other applications such as shallow junction formation by plasma doping, trench doping, and fabrication of blue light emitting materials, PIII has unique advantages over conventional techniques and may be the technique of choice in t...

متن کامل

ذخیره در منابع من


  با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید

ژورنال

عنوان ژورنال: Surface and Coatings Technology

سال: 1997

ISSN: 0257-8972

DOI: 10.1016/s0257-8972(97)00043-1